Optimization of multi-walled carbon nanotube-metal contacts by electrical stressing.
Identifieur interne : 001836 ( Main/Exploration ); précédent : 001835; suivant : 001837Optimization of multi-walled carbon nanotube-metal contacts by electrical stressing.
Auteurs : RBID : pubmed:20009205Abstract
We present experimental data on the contact resistances of three different metal probes, tungsten, palladium and indium, with chemical vapour deposited (CVD) multi-wall carbon nanotubes (MWCNTs). We demonstrate that there is an irreversible modification of the contacts following electrical stressing whereby the circuit resistance converges towards its optimal value prior to current-induced tube failure. Once the probe-MWCNT contact is broken, subsequent recontact experiments reveal that the circuit resistance returns to its initial high level, demonstrating that the modification occurs at the probe contact location and not elsewhere in the circuit. Contact studies with the different metals reveal that Pd metal provides the lowest resistance contact to the MWCNT in our sample.
DOI: 10.1088/0957-4484/21/4/045705
PubMed: 20009205
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<record><TEI><teiHeader><fileDesc><titleStmt><title xml:lang="en">Optimization of multi-walled carbon nanotube-metal contacts by electrical stressing.</title><author><name sortKey="Ryan, P M" uniqKey="Ryan P">P M Ryan</name><affiliation><nlm:affiliation>Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN), School of Chemistry, Trinity College Dublin, Dublin 2, Republic of Ireland. ryanp@tcd.ie</nlm:affiliation><country wicri:rule="url">Irlande (pays)</country></affiliation></author><author><name sortKey="Verhulst, A S" uniqKey="Verhulst A">A S Verhulst</name></author><author><name sortKey="Cott, D" uniqKey="Cott D">D Cott</name></author><author><name sortKey="Romo Negreira, A" uniqKey="Romo Negreira A">A Romo-Negreira</name></author><author><name sortKey="Hantschel, T" uniqKey="Hantschel T">T Hantschel</name></author><author><name sortKey="Boland, John J" uniqKey="Boland J">John J Boland</name></author></titleStmt><publicationStmt><date when="2010">2010</date><idno type="doi">10.1088/0957-4484/21/4/045705</idno><idno type="RBID">pubmed:20009205</idno><idno type="pmid">20009205</idno><idno type="wicri:Area/Main/Corpus">001B69</idno><idno type="wicri:Area/Main/Curation">001B69</idno><idno type="wicri:Area/Main/Exploration">001836</idno></publicationStmt></fileDesc><profileDesc><textClass></textClass></profileDesc></teiHeader><front><div type="abstract" xml:lang="en">We present experimental data on the contact resistances of three different metal probes, tungsten, palladium and indium, with chemical vapour deposited (CVD) multi-wall carbon nanotubes (MWCNTs). We demonstrate that there is an irreversible modification of the contacts following electrical stressing whereby the circuit resistance converges towards its optimal value prior to current-induced tube failure. Once the probe-MWCNT contact is broken, subsequent recontact experiments reveal that the circuit resistance returns to its initial high level, demonstrating that the modification occurs at the probe contact location and not elsewhere in the circuit. Contact studies with the different metals reveal that Pd metal provides the lowest resistance contact to the MWCNT in our sample.</div></front></TEI><pubmed><MedlineCitation Owner="NLM" Status="PubMed-not-MEDLINE"><PMID Version="1">20009205</PMID><DateCreated><Year>2009</Year><Month>12</Month><Day>21</Day></DateCreated><DateCompleted><Year>2010</Year><Month>02</Month><Day>25</Day></DateCompleted><Article PubModel="Print-Electronic"><Journal><ISSN IssnType="Electronic">1361-6528</ISSN><JournalIssue CitedMedium="Internet"><Volume>21</Volume><Issue>4</Issue><PubDate><Year>2010</Year><Month>Jan</Month><Day>29</Day></PubDate></JournalIssue><Title>Nanotechnology</Title><ISOAbbreviation>Nanotechnology</ISOAbbreviation></Journal><ArticleTitle>Optimization of multi-walled carbon nanotube-metal contacts by electrical stressing.</ArticleTitle><Pagination><MedlinePgn>045705</MedlinePgn></Pagination><ELocationID EIdType="doi" ValidYN="Y">10.1088/0957-4484/21/4/045705</ELocationID><Abstract><AbstractText>We present experimental data on the contact resistances of three different metal probes, tungsten, palladium and indium, with chemical vapour deposited (CVD) multi-wall carbon nanotubes (MWCNTs). We demonstrate that there is an irreversible modification of the contacts following electrical stressing whereby the circuit resistance converges towards its optimal value prior to current-induced tube failure. Once the probe-MWCNT contact is broken, subsequent recontact experiments reveal that the circuit resistance returns to its initial high level, demonstrating that the modification occurs at the probe contact location and not elsewhere in the circuit. Contact studies with the different metals reveal that Pd metal provides the lowest resistance contact to the MWCNT in our sample.</AbstractText></Abstract><AuthorList CompleteYN="Y"><Author ValidYN="Y"><LastName>Ryan</LastName><ForeName>P M</ForeName><Initials>PM</Initials><Affiliation>Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN), School of Chemistry, Trinity College Dublin, Dublin 2, Republic of Ireland. ryanp@tcd.ie</Affiliation></Author><Author ValidYN="Y"><LastName>Verhulst</LastName><ForeName>A S</ForeName><Initials>AS</Initials></Author><Author ValidYN="Y"><LastName>Cott</LastName><ForeName>D</ForeName><Initials>D</Initials></Author><Author ValidYN="Y"><LastName>Romo-Negreira</LastName><ForeName>A</ForeName><Initials>A</Initials></Author><Author ValidYN="Y"><LastName>Hantschel</LastName><ForeName>T</ForeName><Initials>T</Initials></Author><Author ValidYN="Y"><LastName>Boland</LastName><ForeName>John J</ForeName><Initials>JJ</Initials></Author></AuthorList><Language>eng</Language><PublicationTypeList><PublicationType>Journal Article</PublicationType><PublicationType>Research Support, Non-U.S. Gov't</PublicationType></PublicationTypeList><ArticleDate DateType="Electronic"><Year>2009</Year><Month>12</Month><Day>16</Day></ArticleDate></Article><MedlineJournalInfo><Country>England</Country><MedlineTA>Nanotechnology</MedlineTA><NlmUniqueID>101241272</NlmUniqueID><ISSNLinking>0957-4484</ISSNLinking></MedlineJournalInfo></MedlineCitation><PubmedData><History><PubMedPubDate PubStatus="aheadofprint"><Year>2009</Year><Month>12</Month><Day>16</Day></PubMedPubDate><PubMedPubDate PubStatus="entrez"><Year>2009</Year><Month>12</Month><Day>17</Day><Hour>6</Hour><Minute>0</Minute></PubMedPubDate><PubMedPubDate PubStatus="pubmed"><Year>2009</Year><Month>12</Month><Day>17</Day><Hour>6</Hour><Minute>0</Minute></PubMedPubDate><PubMedPubDate PubStatus="medline"><Year>2009</Year><Month>12</Month><Day>17</Day><Hour>6</Hour><Minute>1</Minute></PubMedPubDate></History><PublicationStatus>ppublish</PublicationStatus><ArticleIdList><ArticleId IdType="pii">S0957-4484(10)28679-8</ArticleId><ArticleId IdType="doi">10.1088/0957-4484/21/4/045705</ArticleId><ArticleId IdType="pubmed">20009205</ArticleId></ArticleIdList></PubmedData></pubmed></record>Pour manipuler ce document sous Unix (Dilib)
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